Yamabe, Masaki: search on Z-Library

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1

SPIE Proceedings [SPIE Microelectronics, MEMS, and Nanotechnology - Canberra, ACT, Australia (Wednesday 5 December 2007)] Microelectronics: Design, Technology, and Packaging III - Reliability evaluation for solder joints in embedded electronic package

Yamabe, Masashi, Hariz, Alex J., Varadan, Vijay K., Yu, Qiang, Shibutani, Tadahiro, Miyauchi, Hiroki, Shiratori, Masaki, Ohhashi, Hideki

Year:

2007

Language:

english

File:

PDF, 860 KB

english, 2007

2

A SHORT FLASH OF MERCURY RESONANCE LINE AT 253.7 NM

Sato, Shin, Okazaki, Kiyoshi, Yamabe, Masaki, Umemoto, Hironobu, Tsunashima, Shigeru, Ueno, Takumi, Yokoyama, Atsushi, Hatano, Yoshihiko

Journal:

Chemistry Letters

Year:

1976

Language:

english

File:

PDF, 4.84 MB

english, 1976

3

Characteristics of deeply Li-doped polyacenic semiconductor material and fabrication of a Li secondary battery

Shizukuni Yata, Yukinori Hato, Hajime Kinoshita, Nobuo Ando, Akihiro Anekawa, Takeshi Hashimoto, Masaki Yamaguchi, Kazuyoshi Tanaka, Tokio Yamabe

Journal:

Synthetic Metals

Year:

1995

Language:

english

File:

PDF, 483 KB

english, 1995

4

Status and issues of electron projection lithography

Journal:

Journal of Micro/Nanolithography MEMS and MOEMS

Year:

2005

Language:

english

File:

PDF, 2.15 MB

english, 2005

5

Results of Breast-Conserving Therapy for Ductal Carcinomain situ: The Kyoto University Experiences

Masaki Kokubo, Michihide Mitsumori, Kazunori Kanehira, Takashi Inamoto, Keiichi Mise, Hiroshi Kodama, Hirohiko Yamabe, Masahiro Hiraoka

Journal:

Year:

2001

Language:

english

File:

PDF, 486 KB

english, 2001

6

Phase Constituent and Reverse Martensitic Transformation Temperature of PtTi-CoTi Diffusion Couple Heat-Treated at 1373K

Hosoda, Hideki, Tsutsumi, Satoshi, Tahara, Masaki, Inamura, Tomonari, Goto, Kenji, Kanetaka, Hiroyasu, Yamabe-Mitarai, Yoko

Journal:

MRS Proceedings

Year:

2015

Language:

english

File:

PDF, 708 KB

english, 2015

7

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Emerging Lithographic Technologies VIII - Design rule of hole-layer for electron projection lithography

Koike, Kaoru, Mackay, R. Scott, Sakaue, Hiroshi, Takenaka, Hiroshi, Koba, Fumihiro, Tsuchida, Takahiro, Yamabe, Masaki

Year:

2004

Language:

english

File:

PDF, 200 KB

english, 2004

8

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - Utilization of design intent information for mask manufacturing (II)

Kato, Kokoro, Hosono, Kunihiro, Endo, Masakazu, Inoue, Tadao, Yamabe, Masaki

Year:

2009

Language:

english

File:

PDF, 534 KB

english, 2009

9

Synthesis and structures of polysilacage compounds containing a silicon–silicon inter-element linkage

Masaki Shimizu, Tamejiro Hiyama*, Toshiaki Matsubara*, Tokio Yamabe

Journal:

Journal of Organometallic Chemistry

Year:

2000

Language:

english

File:

PDF, 343 KB

english, 2000

10

An Improved Electron Scattering Simulation at the Mask in a Projection Lithography System

Kotera, Masatoshi, Ishida, Yoshihisa, Naruse, Kentarou, Shimizu, Isao, Tomo, Youichi, Yoshida, Akira, Kojima, Yoshinori, Yamabe, Masaki

Journal:

Japanese Journal of Applied Physics

Year:

2000

Language:

english

File:

PDF, 63 KB

english, 2000

11

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Design for Manufacturability through Design-Process Integration IV - Practical use of the repeating patterns in mask writing

Shoji, Masahiro, Rieger, Michael L., Thiele, Joerg, Inoue, Tadao, Yamabe, Masaki

Year:

2010

Language:

english

File:

PDF, 373 KB

english, 2010

12

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - Improvement of data transfer speed and development of an EB data verification system in a VSB mask writer

Wakimoto, Osamu, Hosono, Kunihiro, Manabe, Hironobu, Hoshi, Hiromichi, Samoto, Norihiko, Komagata, Tadashi, Nakagawa, Yasutoshi, Yamabe, Masaki

Year:

2009

Language:

english

File:

PDF, 785 KB

english, 2009

13

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, California (Monday 13 September 2010)] Photomask Technology 2010 - Optimization of MDP, mask writing, and mask inspection for mask manufacturing cost reduction

Yamabe, Masaki, Montgomery, M. Warren, Maurer, Wilhelm, Inoue, Tadao, Shoji, Masahiro, Yamada, Akio, Hoshi, Hiromichi, Takahara, Kenichi

Year:

2010

Language:

english

File:

PDF, 3.85 MB

english, 2010

14

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Reducing the shot counts of mask writing with OPC by extracting repeating patterns

Shoji, Masahiro, Zurbrick, Larry S., Montgomery, M. Warren, Inoue, Tadao, Yamabe, Masaki

Year:

2009

Language:

english

File:

PDF, 346 KB

english, 2009

15

Effect of Nb Addition on Martensitic Transformation Behavior of AuTi-15Co Based Biomedical Shape Memory Alloys

Shim, Hyunbo, Tahara, Masaki, Inamua, Tomonari, Goto, Kenji, Yamabe-Mitarai, Yoko, Hosoda, Hideki

Journal:

MATERIALS TRANSACTIONS

Year:

2015

Language:

english

File:

PDF, 3.35 MB

english, 2015

16

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Design for Manufacturability through Design-Process Integration III - Verification of extraction repeating pattern efficiency from many actual device data

Singh, Vivek K., Shoji, Masahiro, Inoue, Tadao, Rieger, Michael L., Yamabe, Masaki

Year:

2009

Language:

english

File:

PDF, 220 KB

english, 2009

17

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Printability verification function of mask inspection system

Tsuchiya, Hideo, Zurbrick, Larry S., Montgomery, M. Warren, Yamabe, Masaki, Tokita, Masakazu, Takahara, Kenichi, Usuda, Kinya, Ozaki, Fumio, Kikuiri, Nobutaka

Year:

2009

Language:

english

File:

PDF, 1.61 MB

english, 2009

18

SPIE Proceedings [SPIE 24th European Mask and Lithography Conference - Dresden, Germany (Monday 21 January 2008)] 24th European Mask and Lithography Conference - Mask data rank (MDR) and its application

Kato, Kokoro, Endo, Masakazu, Inoue, Tadao, Yamabe, Masaki

Year:

2008

Language:

english

File:

PDF, 375 KB

english, 2008

19

Anderson localization in a polyacetylene chain with sp3 carbon defects

Kazuyoshi Tanaka, Shozo Yamanaka, Masaki Oiji, Tokio Yamabe

Journal:

Synthetic Metals

Year:

1988

Language:

english

File:

PDF, 472 KB

english, 1988

20

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Mask data prioritization based on design intent - II

Endo, Masakazu, Zurbrick, Larry S., Montgomery, M. Warren, Kato, Kokoro, Inoue, Tadao, Yamabe, Masaki

Year:

2009

Language:

english

File:

PDF, 335 KB

english, 2009

21

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Concurrent optimization of MDP, mask writing, and mask inspection for mask manufacturing cost reduction

Yamabe, Masaki, Kawahira, Hiroichi, Zurbrick, Larry S., Inoue, Tadao, Shoji, Masahiro, Yasuda, Hiroshi, Hoshi, Hiromichi, Tokita, Masakazu

Year:

2008

Language:

english

File:

PDF, 1.13 MB

english, 2008

22

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVI - Yokohama, Japan (Wednesday 8 April 2009)] Photomask and Next-Generation Lithography Mask Technology XVI - Present status of multi-column cell exposure system for mask writing

Yasuda, Hiroshi, Hosono, Kunihiro, Yamada, Akio, Yamabe, Masaki

Year:

2009

Language:

english

File:

PDF, 1.44 MB

english, 2009

23

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology XI - Yokohama, Japan (Wednesday 14 April 2004)] Photomask and Next-Generation Lithography Mask Technology XI - Status and issues of EPL

Yamabe, Masaki, Tanabe, Hiroyoshi

Year:

2004

Language:

english

File:

PDF, 2.34 MB

english, 2004

24

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Emerging Lithographic Technologies VIII - Performance and stability of electron projection lithography tool

Sakaue, Hiroshi, Mackay, R. Scott, Koike, Kaoru, Takenaka, Hiroshi, Tsuchida, Takahiro, Koba, Fumihiro, Yamabe, Masaki

Year:

2004

Language:

english

File:

PDF, 404 KB

english, 2004

25

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Emerging Lithographic Technologies VII - EPL stencil mask defect inspection system using transmission electron beam

Yamamoto, Jiro, Iwasaki, Teruo, Yamabe, Masaki, Anazawa, Norimichi, Maruyama, Satoru, Tsuta, Kiyoaki, Engelstad, Roxann L.

Year:

2003

Language:

english

File:

PDF, 679 KB

english, 2003

26

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Design for Manufacturability through Design-Process Integration IV - Development of a design intent extraction flow for mask manufacturing

Kato, Kokoro, Rieger, Michael L., Thiele, Joerg, Endo, Masakazu, Inoue, Tadao, Yamabe, Masaki

Year:

2010

Language:

english

File:

PDF, 477 KB

english, 2010

27

Martensitic Transformation and Related Properties of AuTi-FeTi Pseudobinary Alloys

Aoki, Taku, Tahara, Masaki, Goto, Kenji, Yamabe-Mitarai, Yoko, Kanetaka, Hiroyasu, Inamura, Tomonari, Hosoda, Hideki

Journal:

Advanced Materials Research

Year:

2014

Language:

english

File:

PDF, 2.12 MB

english, 2014

28

SPIE Proceedings [SPIE SPIE Photomask Technology - Monterey, CA (Monday 14 September 2009)] Photomask Technology 2009 - Exposure results with four column cells in multicolumn EB exposure system

Yamada, Akio, Zurbrick, Larry S., Montgomery, M. Warren, Yasuda, Hiroshi, Yamabe, Masaki

Year:

2009

Language:

english

File:

PDF, 9.69 MB

english, 2009

29

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVII - Yokohama, Japan (Tuesday 13 April 2010)] Photomask and Next-Generation Lithography Mask Technology XVII - Evaluation of throughput improvement and character projection in multi-column-cell E-beam exposure system

Yamada, Akio, Hosono, Kunihiro, Oae, Yoshihisa, Okawa, Tatsuro, Takizawa, Masahiro, Yamabe, Masaki

Year:

2010

Language:

english

File:

PDF, 1.93 MB

english, 2010

30

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California (Sunday 21 February 2010)] Alternative Lithographic Technologies II - Evaluation of throughput improvement by MCC and CP in multicolumn e-beam exposure system

Yamada, Akio, Herr, Daniel J. C., Oae, Yoshihisa, Okawa, Tatsuro, Takizawa, Masahiro, Yamabe, Masaki

Year:

2010

Language:

english

File:

PDF, 3.48 MB

english, 2010

31

New prediction technique of master curve of rubber material from the data by dynamic mechanical analyzer

MAEDA, Naruto, FUJIKAWA, Masaki, MIYAZAKI, Tatsujiro, MAKABE, Chobin, YAMABE, Junichiro, KOISHI, Masataka

Journal:

Transactions of the JSME (in Japanese)

Year:

2016

Language:

english

File:

PDF, 2.76 MB

english, 2016

32

SPIE Proceedings [SPIE SPIE's 27th Annual International Symposium on Microlithography - Santa Clara, CA (Sunday 3 March 2002)] Emerging Lithographic Technologies VI - Defect printability analysis on electron projection lithography with diamond stencil reticle

Tomo, Yoichi, Kojima, Yoshinori, Shimizu, Sumito, Watanabe, Manabu, Takenaka, Hiroshi, Yamashita, Hiroshi, Iwasaki, Teruo, Takahashi, Kimitoshi, Yamabe, Masaki, Engelstad, Roxann L.

Year:

2002

Language:

english

File:

PDF, 2.29 MB

english, 2002

33

SPIE Proceedings [SPIE SPIE Advanced Lithography - San Jose, California, USA (Sunday 22 February 2009)] Alternative Lithographic Technologies - Monitor and self-diagnostic technology for mask e-beam writing system

Samoto, Norihiko, Schellenberg, Frank M., La Fontaine, Bruno M., Manabe, Hironobu, Wakimoto, Osamu, Iida, Satoshi, Hoshi, Hiromichi, Yamabe, Masaki

Year:

2009

Language:

english

File:

PDF, 470 KB

english, 2009

34

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVII - Yokohama, Japan (Tuesday 13 April 2010)] Photomask and Next-Generation Lithography Mask Technology XVII - Evaluation of mask manufacturing efficiency using mask data rank information

Kato, Kokoro, Hosono, Kunihiro, Endo, Masakazu, Inoue, Tadao, Yamabe, Masaki, Nakatake, Shigetoshi

Year:

2010

Language:

english

File:

PDF, 779 KB

english, 2010

35

SPIE Proceedings [SPIE Photomask and Next Generation Lithography Mask Technology X - Yokohama, Japan (Wednesday 16 April 2003)] Photomask and Next-Generation Lithography Mask Technology X - Mask pattern generator employing EPL technology

Yoshioka, Nobuyuki, Tanabe, Hiroyoshi, Yamabe, Masaki, Wakamiya, Wataru, Endo, Nobuhiro

Year:

2003

Language:

english

File:

PDF, 279 KB

english, 2003

36

SPIE Proceedings [SPIE Microlithography '97 - Santa Clara, CA (Monday 10 March 1997)] Emerging Lithographic Technologies - Effect of SiC x-ray masks on alignment accuracy of heterodyne alignment

Aoyama, Hajime, Kumasaka, Fumiaki, Iba, Yoshihisa, Taguchi, Takao, Takeda, Masayuki, Yamabe, Masaki, Fukuda, Makoto, Suzuki, Masanori, Deguchi, Kimiyoshi, Seeger, David E.

Year:

1997

Language:

english

File:

PDF, 382 KB

english, 1997

37

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVII - Yokohama, Japan (Tuesday 13 April 2010)] Photomask and Next-Generation Lithography Mask Technology XVII - Mask inspection system with variable sensitivity and printability verification function

Inoue, Takafumi, Hosono, Kunihiro, Takahara, Kenichi, Tsuchiya, Hideo, Tokita, Masakazu, Inoue, Tadao, Yamabe, Masaki

Year:

2010

Language:

english

File:

PDF, 1.99 MB

english, 2010

38

SPIE Proceedings [SPIE Photomask Japan '98 Symposium on Photomask and X-Ray Mask Technology V - Kawasaki City, Japan (Thursday 9 April 1998)] Photomask and X-Ray Mask Technology V - Present status of x-ray lithography

Yamabe, Masaki, Aizaki, Naoaki

Year:

1998

Language:

english

File:

PDF, 1.52 MB

english, 1998

39

SPIE Proceedings [SPIE Photomask and NGL Mask Technology XVII - Yokohama, Japan (Tuesday 13 April 2010)] Photomask and Next-Generation Lithography Mask Technology XVII - Extraction and utilization of the repeating patterns for CP writing in mask making

Shoji, Masahiro, Hosono, Kunihiro, Inoue, Tadao, Yamabe, Masaki

Year:

2010

Language:

english

File:

PDF, 1.36 MB

english, 2010

40

The Absolute Rate Constants of Reaction of Hydrogen Atoms with Several Olefins

Ishikawa, Yo-ichi, Yamabe, Masaki, Noda, Akihiko, Sato, Shin

Journal:

Bulletin of the Chemical Society of Japan

Year:

1978

File:

PDF, 1000 KB

1978

41

A TEA-CO2 laser oscillation by an inductive energy storage pulsed-power generator using a wire-fuse opening switch

Satoshi Ihara, Masaki Kamatani, Masashi Ishimine, Saburo Sato, Chobei Yamabe, Hidenori Akiyama

Journal:

Electrical Engineering in Japan

Year:

2000

Language:

english

File:

PDF, 209 KB

english, 2000

42

SPIE Proceedings [SPIE Microlithography 2004 - Santa Clara, CA (Sunday 22 February 2004)] Emerging Lithographic Technologies VIII - Preliminary results of EB stepper in the application of 65-nm process

Takenaka, Hiroshi, Mackay, R. Scott, Koike, Kaoru, Tsuchida, Takahiro, Koba, Fumihiro, Sakaue, Hiroshi, Yamabe, Masaki

Year:

2004

Language:

english

File:

PDF, 1.79 MB

english, 2004

43

Amorphous Refractory Compound Film Material for X-Ray Mask Absorbers

Iba, Yoshihisa, Kumasaka, Fumiaki, Iizuka, Takashi, Yamabe, Masaki

Journal:

Japanese Journal of Applied Physics

Year:

2000

Language:

english

File:

PDF, 455 KB

english, 2000

44

Etching Residues of Sputtered Ta Film Using Chlorine-Based Plasma

Iba, Yoshihisa, Kumasaka, Fumiaki, Takeda, Masayuki, Aoyama, Hajime, Yamabe, Masaki

Journal:

Japanese Journal of Applied Physics

Year:

1998

Language:

english

File:

PDF, 313 KB

english, 1998

45

SPIE Proceedings [SPIE Microlithography Conference - Santa Clara, CA (Monday 2 March 1987)] Electron-Beam, X-Ray, and Ion-Beam Lithographies VI - Production Efficiency And Intensity Distribution Of Pd X-Ray Source For Lithography

Yamabe, Masaki, Kitamura, Yoshitaka, Furukawa, Yasuo, Inagaki, Takefumi, Blais, Phillip D.

Year:

1987

Language:

english

File:

PDF, 391 KB

english, 1987

46

Mechanical and Superelastic Properties of Au-51Ti-18Co Biomedical Shape Memory Alloy Heat-Treated at 1173 K to 1373 K

Buasri, Taywin, Shim, Hyunbo, Tahara, Masaki, Inamura, Tomonari, Goto, Kenji, Kanetaka, Hiroyasu, Yamabe-Mitarai, Yoko, Hosoda, Hideki

Journal:

Advances in Science and Technology

Year:

2016

Language:

english

File:

PDF, 1.48 MB

english, 2016

47

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - Mask data prioritization based on design intent

Kato, Kokoro, Kawahira, Hiroichi, Zurbrick, Larry S., Endo, Masakazu, Inoue, Tadao, Yamabe, Masaki

Year:

2008

Language:

english

File:

PDF, 377 KB

english, 2008

48

SPIE Proceedings [SPIE Microlithography 2003 - Santa Clara, CA (Sunday 23 February 2003)] Emerging Lithographic Technologies VII - Subfield distortion of an EPL stencil mask

Takenaka, Hiroshi, Yamashita, Hiroshi, Koike, Kaoru, Yamabe, Masaki, Engelstad, Roxann L.

Year:

2003

Language:

english

File:

PDF, 1.30 MB

english, 2003

49

SPIE Proceedings [SPIE Photomask Technology - Monterey, CA (Monday 6 October 2008)] Photomask Technology 2008 - E-beam exposure system using multi column cell (MCC) with CP for mask writing

Yamada, Akio, Kawahira, Hiroichi, Zurbrick, Larry S., Yasuda, Hiroshi, Yamabe, Masaki

Year:

2008

Language:

english

File:

PDF, 485 KB

english, 2008

50

Laser oscillation using an inductive energy storage pulsed-power generator with plasma opening switch

Masaki Kamatani, Satoshi Ihara, Saburoh Satoh, Chobei Yamabe

Journal:

Year:

2000

Language:

english

File:

PDF, 354 KB

english, 2000

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